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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
NONE
Issue Dt:
Application #:
10236779
Filing Dt:
09/06/2002
Publication #:
Pub Dt:
03/13/2003
Inventor:
Norihiro Katakura
Title:
Methods for manufacturing reticles and reticle blanks exhibiting reduced warp and resist stress for use in charged-particle-beam microlithography
Assignment: 1
Reel/Frame:
013275/0609Recorded: 09/06/2002Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
09/06/2002
Assignee:
2-3 MARUNOUCHI 3-CHOME CHIYODA-KU
TOKYO 100-8331, JAPAN
Correspondent:
KLARQUIST SPARKMAN LLP
DONALD L. STEPHENS JR.
ONE WORLD TRADE CENTER, SUITE 1600
121 S.W. SALMON STREET
PORTLAND, OREGON 97204-2988
Assignment: 2
Reel/Frame:
013275/0617Recorded: 09/06/2002Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
09/06/2002
Assignee:
2-3 MARUNOUCHI 3-CHOME
CHIYODA-KU, TOKYO 100-8331, JAPAN
Correspondent:
KLARQUIST SPARKMAN LLP
DONALD L. STEPHENS JR.
ONE WORLD TRADE CENTER, SUITE 1600
121 SW SALMON STREET
PORTLAND, OR 97204-2988

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