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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
10359297
Filing Dt:
02/06/2003
Publication #:
Pub Dt:
09/25/2003
Inventors:
Ching-Ping Wu, H. W. Lee, Tung-Yuan Hou, Yen-Huei Su, Nan-Tzu Lian, Hsin-Cheng Liu
Title:
Method of removing photo-resist and polymer residue
Assignment: 1
Reel/Frame:
014158/0034Recorded: 06/10/2003Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
01/30/2003
Exec Dt:
01/30/2003
Exec Dt:
01/30/2003
Exec Dt:
01/30/2003
Exec Dt:
01/30/2003
Exec Dt:
01/30/2003
Assignee:
NO. 16, LI-HSIN RD
SCIENCE-BASED INDUSTRIAL PARK
HSINCHU, TAIWAN ROC
Correspondent:
RABIN & BERDO, P.C.
ROBERT H. BERDO, JR.
1101 14TH STREET, N.W., STE. 500
WASHINGTON, D.C. 20005

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