Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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08/15/2006
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Application #:
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10424269
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Filing Dt:
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04/28/2003
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Publication #:
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Pub Dt:
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12/04/2003
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Inventors:
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Tomohiro Kobayashi, Satoshi Watanabe, Tsunehiro Nishi, Youichi Ohsawa et al
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Title:
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PHOTO ACID GENERATOR, CHEMICAL AMPLIFICATION RESIST MATERIAL AND PATTERN FORMATION METHOD
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 6-1 OTEMACHI 2-CHOME |
| CHIYODA-KU, TOKYO, JAPAN |
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| MYERS BIGEL SIBLEY & SAJOVEC |
| F. MICHAEL SAJOVEC |
| P.O. BOX 37428 |
| RALEIGH, NC 27627 |
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