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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
10177634
Filing Dt:
06/18/2002
Publication #:
Pub Dt:
12/18/2003
Inventors:
Chen-Cheng Yung, Ming-Chuan Wang, Chang-Hao Yang
Title:
Method for forming a photoresist pattern on a semiconductor substrate
Assignment: 1
Reel/Frame:
013050/0766Recorded: 06/18/2002Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
05/29/2002
Exec Dt:
05/29/2002
Exec Dt:
05/29/2002
Assignee:
SCIENCE-BASED INDUSTRIAL PARK
NO. 16, CREATION RD. 1
HSIN CHU, TAIWAN ROC
Correspondent:
NEEDLE & ROSENBERG, P.C.
TIM TINGKANG XIA, ESQ.
127 PEACHTREE STREET, N.E.
THE CANDLER BUILDING
ATLANTA, GA 30303-1811

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