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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
10218179
Filing Dt:
08/12/2002
Publication #:
20040027781
Pub Dt:
02/12/2004
Inventors:
Hiroji Hanawa, Andrew Nguyen, Kartik Ramaswamy, Kenneth S. Collins et al
Title:
Low loss RF bias electrode for a plasma reactor with enhanced wafer edge RF coupling and highly efficient wafer cooling
Assignment: 1
Reel/Frame:
013198/0537Recorded: 10/25/2002Pages: 13
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
HANAWA, HIROJI
Exec Dt:
09/23/2002
NGUYEN, ANDREW
Exec Dt:
09/18/2002
RAMASWAMY, KARTIK
Exec Dt:
09/17/2002
COLLINS, KENNETH S.
Exec Dt:
09/17/2002
MONROY, GONZALO ANTONIO
Exec Dt:
10/17/2002
PU, BRYAN Y.
Exec Dt:
09/18/2002
Assignee:
APPLIED MATERIALS, INC.
P.O. BOX 450-A
PATENT COUNSEL, M/S 2061
SANTA CLARA, CALIFORNIA 95052
Correspondent:
APPLIED MATERIALS, INC.
JOSEPH BACH
PATENT COUNSEL M/S 2061
P.O. BOX 450-A
SANTA CLARA, CALIFORNIA 95052

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