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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
10452819
Filing Dt:
06/02/2003
Publication #:
Pub Dt:
03/04/2004
Inventors:
Jang Gyoo Yang, Daniel J. Hoffman, Brian C. Lue, Tetsuya Ishikawa et al
Title:
Cathode pedestal for a plasma etch reactor
Assignment: 1
Reel/Frame:
014034/0900Recorded: 10/08/2003Pages: 8
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
07/01/2003
Exec Dt:
07/01/2003
Exec Dt:
07/01/2003
Exec Dt:
07/01/2003
Exec Dt:
07/01/2003
Exec Dt:
07/01/2003
Exec Dt:
07/07/2003
Exec Dt:
07/01/2003
Exec Dt:
07/01/2003
Assignee:
P.O. BOX 50-A
PATENT COUNSEL, M/S 2061
SANTA CLARA, CALIFORNIA 95052
Correspondent:
APPLIED MATERIALS, INC.
JOSEPH BACH
PATENT COUNSEL, M/S 2061
P.O. BOX 450-A
SANTA CLARA, CA 95052

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