Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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01/11/2005
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Application #:
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10338156
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Filing Dt:
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01/08/2003
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Publication #:
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Pub Dt:
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07/08/2004
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Inventors:
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Chew Hoe Ang, Eng-Hua Lim, Randall Cher Liang Cha, Jia Zhen Zheng, Elgin Quek, Daniel Yen et al
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Title:
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METHOD TO PRODUCE DUAL GATES (ONE METAL AND ONE POLY OR METAL SILICIDE) FOR CMOS DEVICES USING SPUTTERED METAL DEPOSITION, METALLIC ION IMPLANTATION, OR SILICON IMPLANTATION, AND LASER ANNEALING
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 60 WOODLANDS INDUSTRIAL PARK D |
| SINGAPORE 738406, SINGAPORE |
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| GEORGE O. SAILE |
| 28 DAVID AVENUE |
| POUGHKEEPSIE, NY 12603 |
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Assignment:
2
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CORRECTED ASSIGNMENT TO CORRECT THE NAME OF THE SIXTH INVENTOR. PREVIOUSLY RECORDED ON REEL 013647 FRAME 0813
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| STREET 2 |
| 60 WOODLANDS INDUSTRIAL PARK D. |
| SINGAPORE, SINGAPORE 738406 |
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| GEORGE O. SAILE |
| 28 DAVIS AVENUE |
| POOUGHKEEPSIE, NY 12603 |
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