Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10377293
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Filing Dt:
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02/27/2003
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Publication #:
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Pub Dt:
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09/02/2004
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Inventors:
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Haoren Zhuang, Uwe Wellhausen, Ulrich Egger, Rainer Bruchhaus, Karl Hornik, Jingyu Lian et al
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Title:
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Method for formation of residue-free hardmask elements during a semiconductor device fabrication process
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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ST. MARTIN STR. 53 |
MUNICH, GERMANY 81669 |
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1-1, SHIBAURA 1-CHOME |
MINATO-KU |
TOKYO, JAPAN |
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LERNER, DAVID, LITTENBERG ET AL. |
GREGORY S. GEWIRTZ |
600 SOUTH AVENUE WEST |
WESTFIELD, NJ 07090 |
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Assignment:
2
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CORRECTIVE ASSIGNMENT TO CORRECT DOCUMENT PREVIOUSLY RECORDED AT REEL 014138 FRAME 0551.
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ST. MARTIN STR. 53 |
81669 MUNICH, GERMANY |
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1-1 SHIBAURA 1-CHOME, MINATO-KU |
TOKYO 105-8001, JAPAN |
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LERNER, DAVID, LITTENBERG, ET AL. |
GREGORY S. GEWIRTZ |
600 SOUTH AVENUE WEST |
WESTFIELD, NJ 07090 |
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