Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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06/13/2006
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Application #:
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10637347
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Filing Dt:
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08/08/2003
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Publication #:
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Pub Dt:
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02/10/2005
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Inventors:
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Wen-Chuan Wang, Shih-Ming Chang, Chih-Chen Chin, Chi-Lun Lu, Sheng-Chi Chin et al
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Title:
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METHOD TO IMPROVE PHOTOMASK CRITICAL DIMENSION UNIFORMITY AND PHOTOMASK FABRICATION PROCESS
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Assignment:
1
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RERECORD TO CORRECT THE DOCUMENT EXECUTION DATE FOR THE 1ST AND 2ND ASSIGNOR, DOCUMENT PREVIOUSLY RECORDED ON REEL 014848 FRAME 0119. ASSIGNOR CONFIRMS THE ASSIGNMENT.
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| NO. 8, LI-HSIN ROAD 6 |
| SCIENCE BASED INDUSTRIAL PARK |
| SIN-CHU, TAIWAN 300-77, R.O.C. |
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| WILLIAM H. MURRAY, ESQUIRE |
| DUANE MORRIS LLP |
| ONE LIBERTY PLACE |
| PHILADELPHIA, PA 19103 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO. 8, LI-HSIN ROAD 6 |
| SCIENCE-BASED INDUSTRIAL PARK |
| HSIN-CHU 300-77 R.O.C., TAIWAN |
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| DUANE MORRIS LLP |
| WILLIAM H. MURRAY, ESQ. |
| ONE LIBERTY PLACE |
| PHILADELPHIA, PA 19103 |
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