Patent Assignment Abstract of Title
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Total Assignments:
4
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Patent #:
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Issue Dt:
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01/30/2007
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Application #:
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10974726
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Filing Dt:
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10/28/2004
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Publication #:
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Pub Dt:
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08/04/2005
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Inventors:
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Christoph Hohle, Ralph Dammel, Michael Francis Houlihan
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Title:
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PHOTORESIST SUITABLE FOR USE IN 157 NM PHOTOLITHOGRAPHY AND INCLUDING A POLYMER BASED ON FLUORINATED NORBORNENE DERIVATIVES
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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ST.-MARTIN-STR. 53 |
MUNICH, GERMANY 81669 |
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EDELL, SHAPIRO & FINNAN, LLC |
SUITE 400 |
1901 RESEARCH BLVD. |
ROCKVILLE, MD 20850 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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ST.-MARTIN-STR. 53 |
MUNICH, GERMANY 81669 |
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70 MEISTER AVENUE |
SOMERVILLE, NEW JERSEY 08876 |
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ANDREW J. ALDAG - ESF, LLC |
1901 RESEARCH BLVD. |
SUITE 400 |
ROCKVILLE, MD 20850 |
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Assignment:
3
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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GUSTAV-HEINEMANN-RING 212 |
MUNICH, GERMANY 81739 |
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JONATHAN BOCKMAN |
C/O MORRISON & FOERSTER LLP |
1650 TYSONS BOULEVARD SUITE 400 |
MCLEAN, VA 22102 |
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Assignment:
4
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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AM CAMPEON 1-12 |
NEUBIBERG, GERMANY 85579 |
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CPA GLOBAL LIMITED |
LIBERATION HOUSE |
CASTLE STREET |
ST HELIER, JE1 1BL JERSEY |
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