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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
11008019
Filing Dt:
12/09/2004
Publication #:
Pub Dt:
09/22/2005
Inventors:
Hiroshi Kawamoto, Mikie Miyasato, Takuo Oowada, Norio Ishikawa
Title:
Photoresist residue remover composition and semiconductor circuit element production process employing the same
Assignment: 1
Reel/Frame:
016302/0109Recorded: 06/03/2005Pages: 5
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
01/20/2005
Exec Dt:
01/28/2005
Exec Dt:
02/04/2005
Exec Dt:
02/04/2005
Assignees:
2-8, NIHONBASHIHONCHO 3-CHOME, CHUO-KU
TOKYO, JAPAN 103-0023
1-1, SHIBAURA 1-CHOME, MINATO-KU
TOKYO, JAPAN 105-8001
Correspondent:
L.C. BEGIN & ASSOCIATES, PLLC
510 HIGHLAND AVENUE
PMB 403
MILFORD, MICHIGAN 48381

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