Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10519475
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Filing Dt:
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12/28/2004
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Publication #:
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Pub Dt:
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10/13/2005
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Inventors:
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Keisuke Kawamura, Akira Yamada, Yoshiaki Takeuchi, Hiroshi Mashima, Kenji Tagashira
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Title:
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Plasma processing system and its substrate processing process, plasma enhanced chemical vapor deposition system and its film deposition process
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 16-5, KONAN 2-CHOME |
| MINATO-KU, 108-8215, JAPAN |
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| OBLON SPIVAK MCCLELLAND MAIER & NEUSTADT |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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Assignment:
2
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CORRECTIVE ASSIGNMENT PREVIOUSLY RECORDED AT REEL 016251 FRAME 0800, TO CORRECT THE ASSIGNEES ADDRESS. THE CONVEYING PARTIES HEREBY CONFIRM THE ASSIGNMENT OF THE ENTIRE INTEREST.
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| 16-5, KONAN 2-CHOME, MINATO-KU |
| TOKYO 108-8215, JAPAN |
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| OBLON, SPIVAK, MCCLELLAND, MAIER & NEUST |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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