Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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11/18/2008
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Application #:
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11110915
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Filing Dt:
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04/21/2005
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Publication #:
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Pub Dt:
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10/27/2005
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Inventors:
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Takashi Hirano, Eiji Yamanaka
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Title:
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METHOD OF MANUFACTURING PHOTO MASK, MASK PATTERN SHAPE EVALUATION APPARATUS, METHOD OF JUDGING PHOTO MASK DEFECT CORRECTED PORTION, PHOTO MASK DEFECT CORRECTED PORTION JUDGMENT APPARATUS, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-1, SHIBAURA 1-CHOME, MINATO-KU |
| TOKYO 105-8001, JAPAN |
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| FINNEGAN, HENDERSON, FARABOW, ET AL. |
| ERNEST F. CHAPMAN |
| 901 NEW YORK AVENUE, N.W. |
| WASHINGTON, DC 20001-4413 |
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