Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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12/30/2008
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Application #:
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11048484
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Filing Dt:
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02/01/2005
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Publication #:
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Pub Dt:
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12/08/2005
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Inventors:
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Takehiko Nishikawa, Soichiro Fujinaga
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Title:
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MATERIAL FILM FOR A MASK FILM, PROCESS FOR PRODUCING A MASK FILM USING THE MATERIAL FILM AND PROCESS FOR PRODUCING A PRINTING PLATE OF A PHOTOSENSITIVE RESIN
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 23-23, HONCHO, ITABASHI-KU |
| TOKYO 173-0001, JAPAN |
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| FRISHAUF, HOLTZ, GOODMAN & CHICK, PC |
| 220 5TH AVE FL 16 |
| NEW YORK, NY 10001-7708 |
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