Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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05/20/2008
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Application #:
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11137843
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Filing Dt:
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05/25/2005
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Publication #:
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Pub Dt:
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12/29/2005
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Inventors:
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Osamu Takaoka, Ryoji Hagiwara
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Title:
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PHOTOMASK DEFECT CORRECTION METHOD EMPLOYING A COMBINED DEVICE OF A FOCUSED ELECTRON BEAM DEVICE AND AN ATOMIC FORCE MICROSCOPE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 8, NAKASE 1-CHOME, MIHAMA-KU |
| CHIBA-SHI |
| CHIBA 261-8507, JAPAN |
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| BRUCE L. ADAMS |
| ADAMS & WILKS |
| 17 BATTERY PLACE-SUITE 1231 |
| NEW YORK, NY 10004 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 24-14, NISHI-SHIMBASHI 1-CHOME |
| TOKYO, JAPAN 105-0003 |
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| ADAMS & WILKS |
| 17 BATTERY PLACE |
| SUITE 1343 |
| NEW YORK, NY 10004 |
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