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Patent Assignment Abstract of Title
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Total Assignments: 3
Patent #:
NONE
Issue Dt:
Application #:
11248070
Filing Dt:
10/12/2005
Publication #:
Pub Dt:
04/20/2006
Inventors:
Burn Jeng Lin, Jeng-Horng Chen, Chun-Kuang Chen, Tsai-Sheng Gau, Ru-Gun Liu et al
Title:
Photomask with wavelength reduction material and pellicle
Assignment: 1
Reel/Frame:
016901/0071Recorded: 12/15/2005Pages: 6
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
11/25/2005
Exec Dt:
12/14/2005
Exec Dt:
11/29/2005
Exec Dt:
11/29/2005
Exec Dt:
11/29/2005
Exec Dt:
11/29/2005
Exec Dt:
11/30/2005
Exec Dt:
12/01/2005
Assignee:
NO. 8, LI-HSIN RD. 6
SCIENCE-BASED INDUSTRIAL PARK
HSIN-CHU, TAIWAN 300-77
Correspondent:
HAYNES AND BOONE, LLP
901 MAIN STREET, SUITE 3100
DALLAS, TX 75202
Assignment: 2
Reel/Frame:
017379/0841Recorded: 03/28/2006Pages: 17
Conveyance:
SECURITY AGREEMENT
Assignor:
Exec Dt:
12/23/2005
Assignee:
227 W. MONROE
CHICAGO, ILLINOIS 60606
Correspondent:
LAURA KONRATH
WINSTON & STRAWN LLP
35 W. WACKER DR.
CHICAGO, IL 60601
Assignment: 3
Reel/Frame:
018866/0268Recorded: 02/07/2007Pages: 16
Conveyance:
PATENT RELEASE OF SECURITY INTEREST
Assignor:
Exec Dt:
12/19/2006
Assignee:
10586 US HIGHWAY 75 NORTH
WILLIS, TEXAS 77378
Correspondent:
LAURA KONRATH
WINSTON & STRAWN LLP
35 W. WACKER DR.
CHICAGO, ILLINOIS 60601

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