Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10545915
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Filing Dt:
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01/17/2006
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Publication #:
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Pub Dt:
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05/25/2006
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Inventors:
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Jyun Iwashita, Taku Hirayama, Toshikazu Tachikawa
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Title:
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Resist material for liquid immersion lithography process and method for forming resist pattern using the resist material
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150 NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA 211-0012, JAPAN |
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| WENDEROTH LIND & PONACK, L.L.P. |
| ATTN: MATTHEW M. JACOB, ESQ. |
| 2033 K STREET, N.W. |
| SUITE 800 |
| WASHINGTON, DC 20006-1021 |
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Assignment:
2
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SECURITY INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150 EAST 58TH STREET, 18TH FLOOR |
| NEW YORK, NEW YORK 10155 |
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| KATARZYNA GAYSUNAS |
| 1 FEDERAL ST |
| C/O MORGAN, LEWIS & BOCKIUS LLP |
| BOSTON, MA 02110-1726 |
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