Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11355946
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Filing Dt:
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02/17/2006
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Publication #:
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Pub Dt:
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08/24/2006
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Inventors:
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Naoshi Adachi, Yukio Komatsu
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Title:
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Method for forming region of high oxygen concentration under the surface of silicon wafers via heat treatment
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 2-1, SHIBAURA 1-CHOME, MINATO-KU |
| TOKYO, JAPAN 105-8634 |
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| CLARK AND BRODY |
| 1090 VERMONT AVENUE, NW |
| SUITE 250 |
| WASHINGTON, DC 20005 |
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