Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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12/26/2006
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Application #:
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10716266
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Filing Dt:
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11/17/2003
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Publication #:
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Pub Dt:
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12/07/2006
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Inventor:
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Frank E. Gennari
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Title:
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METHOD OF LOCATING AREAS IN AN IMAGE SUCH AS A PHOTO MASK LAYOUT THAT ARE SENSITIVE TO RESIDUAL PROCESSING EFFECTS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1111 FRANKLIN STREETM 12TH FLOOR |
| OAKLAND, CALIFORNIA 94607-5200 |
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| BEYER WEAVER & THOMAS LLP |
| P.O. BOX 778 |
| BERKELEY, CA 94704-0778 |
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Assignment:
2
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CONFIRMATORY LICENSE (SEE DOCUMENT FOR DETAILS).
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| 3701 NORTH FAIRFAX DRIVE |
| OFFICE OF THE GENERAL COUNSEL |
| ARLINGTON, VIRGINIA 22203 |
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| KIMBERLY B. DOWNEY |
| 3701 NORTH FAIRFAX DRIVE |
| OFFICE OF THE GENERAL COUNSEL |
| ARLINGTON, VA 22203 |
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