Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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05/04/2010
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Application #:
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11496627
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Filing Dt:
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08/01/2006
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Publication #:
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Pub Dt:
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02/08/2007
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Inventors:
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Ken-ichi Nonaka, Hideki Hashimoto, Seiichi Yokoyama, Hiroaki Iwakuro, Koichi Nishikawa et al
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Title:
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ION IMPLANTATION MASK AND METHOD FOR MANUFACTURING SAME, SILICON CARBIDE SEMICONDUCTOR DEVICE USING ION IMPLANTATION MASK, AND METHOD FOR MANUFACTURING SAME
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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1-1, MINAMI-AOYAMA 2-CHOME, MINATO-KU |
TOKYO, JAPAN |
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2-1, OHTEMACHI 2-CHOME, CHIYODA-KU |
TOKYO, JAPAN |
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JAMES M. SLATTERY |
BIRCH STEWART KOLASCH & BIRCH, LLP |
8110 GATEHOUSE ROAD, SUITE 100 EAST |
P.O. BOX 747 |
FALLS CHURCH, VA 22040-0747 |
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