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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
11519845
Filing Dt:
09/13/2006
Publication #:
Pub Dt:
03/15/2007
Inventors:
Jong-ho Yun, Byung-hee Kim, Eun-ji Jung
Title:
Method of forming metal silicide layer and related method of fabricating semiconductor devices
Assignment: 1
Reel/Frame:
018307/0215Recorded: 09/13/2006Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
09/13/2006
Exec Dt:
09/13/2006
Exec Dt:
09/13/2006
Assignee:
416, MAETAN-DONG, YEONGTONG-GU, SUWON-SI
GYEONGGI-DO, KOREA, REPUBLIC OF
Correspondent:
STEPHEN R. WHITT
VOLENTINE FRANCOS & WHITT, PLLC
ONE FREEDOM SQUARE
11951 FREEDOM DRIVE, SUITE 1260
RESTON, VA 20190

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