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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
09/16/2008
Application #:
11245412
Filing Dt:
10/05/2005
Publication #:
Pub Dt:
03/22/2007
Inventors:
Hanming Wu, Jiang Zhang, John Chen, Xian J. Ning
Title:
METHOD AND STRUCTURE USING A PURE SILICON DIOXIDE HARDMASK FOR GATE PATTERNING FOR STRAINED SILICON MOS TRANSISTORS
Assignment: 1
Reel/Frame:
021319/0575Recorded: 07/29/2008Pages: 10
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
02/13/2006
Exec Dt:
04/16/2003
Exec Dt:
01/09/2006
Exec Dt:
02/13/2006
Assignee:
18 ZHANG JIANG RD.
PUDONG NEW AREA
SHANGHAI 201203, CHINA
Correspondent:
LU YIN
TOWNSEND AND TOWNSEND AND CREW LLP
TWO EMBARCADERO CENTER
EIGHTH FLOOR
SAN FRANCISCO, CALIFORNIA 94111-3834

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