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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
09/07/2010
Application #:
11273108
Filing Dt:
11/12/2005
Publication #:
Pub Dt:
05/17/2007
Inventors:
Yeow Kheng Lim, Wei Lu, Liang Choo Hsia, Jyoti Gupta, Hao Zhang, Chim Seng Seet
Title:
FORMATION OF METAL SILICIDE LAYER OVER COPPER INTERCONNECT FOR RELIABILITY ENHANCEMENT
Assignment: 1
Reel/Frame:
017236/0500Recorded: 11/12/2005Pages: 5
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
08/15/2005
Exec Dt:
08/15/2005
Exec Dt:
08/15/2005
Exec Dt:
08/15/2005
Exec Dt:
08/16/2005
Exec Dt:
10/31/2005
Assignee:
60 WOODLANDS INDUSTRIAL PARK D, STREET TWO
SINGAPORE, SINGAPORE 738406
Correspondent:
WILLIAM J. STOFFEL
1735 MARKET ST. - STE A455
PHILADELPHIA, PA 19103

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