Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10591718
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Filing Dt:
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09/05/2006
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Publication #:
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Pub Dt:
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08/16/2007
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Inventors:
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Keita Ishiduka, Kotaro Endo
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Title:
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Positive-type resist composition for liquid immersion lithography and method for forming resist pattern
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA, JAPAN 211-0012 |
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| DANIEL A. SCOLA, JR., ESQ. |
| HOFFMANN & BARON, LLP |
| 6900 JERICHO TURNPIKE |
| SYOSSET, NY 11791 |
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