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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
06/01/2010
Application #:
11700131
Filing Dt:
01/31/2007
Publication #:
Pub Dt:
09/27/2007
Inventors:
Toshifumi Suganaga, Tetsuro Hanawa, Takeo Ishibashi
Title:
METHOD OF FORMING RESIST PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Assignment: 1
Reel/Frame:
018873/0386Recorded: 01/31/2007Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
01/19/2007
Exec Dt:
01/19/2007
Exec Dt:
01/19/2007
Assignee:
4-1, MARUNOUCHI 2-CHOME, CHIYODA-KU
TOKYO, JAPAN 100-6334
Correspondent:
MCDERMOTT WILL & EMERY LLP
600 13TH STREET, NW
WASHINGTON, D.C. 20005-3096
Assignment: 2
Reel/Frame:
024973/0001Recorded: 09/10/2010Pages: 82
Conveyance:
CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
04/01/2010
Assignee:
1753, SHIMONUMABE, NAKAHARU-KU, KAWASAKI-SHI,
KANAGAWA, JAPAN 211-8668
Correspondent:
MCDERMOTT WILL & EMERY LLP
600 THIRTEENTH STREET, N.W.
WASHINGTON, DC 20005-3096

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