Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/20/2009
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Application #:
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11852664
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Filing Dt:
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09/10/2007
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Publication #:
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Pub Dt:
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03/20/2008
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Inventors:
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Deog-Bae Kim, Jung-Youl Lee, Geun-Jong Yu, Sang-Jung Kim, Jae-Woo Lee, Jae-Hyun Kim
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Title:
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MONOMER, POLYMER AND COMPOSITION FOR PHOTORESIST
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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472-2, GAJWA-DONG, SEO-KU |
INCHEON, KOREA, REPUBLIC OF 404-250 |
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BIRCH STEWART KOLASCH & BIRCH LLP |
P.O. BOX 747 |
FALLS CHURCH, VA 22040-0747 |
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