Patent Assignment Abstract of Title
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Total Assignments:
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Patent #:
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Issue Dt:
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10/15/2013
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Application #:
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11689720
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Filing Dt:
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03/22/2007
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Publication #:
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Pub Dt:
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04/10/2008
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Inventors:
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Xianmin Tang, Hua Chung, Rongjun Wang, Tza-Jing Gung, Hong Yang, Praburam Gopalraja et al
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Title:
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Sputtering Chamber Having Auxiliary Backside Magnet to Improve Etch Uniformity and Magnetron Producing Sustained Self Sputtering of Ruthenium and Tantalum
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Assignment:
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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3050 BOWERS AVENUE |
SANTA CLARA, CALIFORNIA 95054 |
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APPLIED MATERIALS, INC. |
P. O. BOX 450 A |
SANTA CLARA, CA 95052 |
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05/07/2024 04:51 PM
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