Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Total Assignments:
2
|
|
Patent #:
|
|
Issue Dt:
|
09/27/2011
|
Application #:
|
11795990
|
Filing Dt:
|
07/25/2007
|
|
Publication #:
|
|
Pub Dt:
|
05/29/2008
| | | | |
|
Inventors:
|
Hideo Namatsu, Mitsuru Sato
|
|
Title:
|
RESIST PATTERN FORMING METHOD, SUPERCRITICAL PROCESSING SOLUTION FOR LITHOGRAPHY PROCESS, AND ANTIREFLECTION FILM FORMING METHOD
|
|
|
Assignment:
1
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 3-1, OTEMACHI 2-CHOME, CHIYODA-KU |
| TOKYO, JAPAN |
|
|
|
| 150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA-KEN, JAPAN |
|
|
|
|
| GREGORY A. STOBBS |
| P.O. BOX 828 |
| BLOOMFIELD HILLS, MI 48303 |
|
|
|
Assignment:
2
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 3-1, OTEMACHI 2-CHOME |
| CHIYODA-KU, TOKYO, JAPAN |
|
|
|
|
| DANIEL M. GURFINKEL |
| DENNEMEYER & ASSOCIATES, LLC. |
| 2 NORTH RIVERSIDE PLAZA, SUITE 1500 |
| CHICAGO, IL 60606 |
|
|
Search Results as of:
05/01/2024 02:11 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
