Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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03/17/2009
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Application #:
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11633721
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Filing Dt:
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12/05/2006
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Publication #:
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Pub Dt:
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06/05/2008
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Inventors:
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Keh-Chiang Ku, Pang-Yen Tsai, Chun-Feng Nieh, Li-Ting Wang
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Title:
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SHORT CHANNEL EFFECT ENGINEERING IN MOS DEVICE USING EPITAXIALLY CARBON-DOPED SILICON
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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NO. 8, LI-HSIN RD. 6 |
SCIENCE-BASED INDUSTRIAL PARK |
HSIN-CHU, TAIWAN 300-77 |
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SLATER & MATSIL, L.L.P. |
17950 PRESTON ROAD, SUITE 1000 |
DALLAS, TX 75252 |
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