Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11661426
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Filing Dt:
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02/28/2007
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Publication #:
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Pub Dt:
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08/14/2008
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Inventors:
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Yoshihiro Sawada, Kazumasa Wakiya, Jun Koshiyama, Hidekazu Tajima, Atsushi Miyamoto
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Title:
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Rinsing Liquid for Lithography and Method for Resist Pattern Formation
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150, NAKAMARUKO, NAKAHARA-KU |
| KAWASAKI-SHI |
| KANAGAWA, JAPAN |
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| WENDEROTH, LIND & PONACK, L.L.P. |
| ATTN: MATTHEW M. JACOB, ESQ. |
| 2033 K STREET, N.W., SUITE |
| WASHINGTON, DC 20006-1021 |
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