Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/27/2009
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Application #:
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11587902
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Filing Dt:
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10/27/2006
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Publication #:
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Pub Dt:
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10/23/2008
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Inventors:
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Shuhei Ueda, Yukio Shibano, Atsushi Watabe, Daisuke Kusabiraki
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Title:
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LARGE-SIZE GLASS SUBSTRATE FOR PHOTOMASK AND MAKING METHOD, COMPUTER-READABLE RECORDING MEDIUM, AND MOTHER GLASS EXPOSURE METHOD
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 6-1, OTEMACHI 1-CHOME, CHIYODA-KU |
| TOKYO 100-0004, JAPAN |
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| GERALD M. MURPHY, JR. |
| BIRCH STEWART KOLASCH, ET AL. |
| 8110 GATEHOUSE ROAD, SUITE 100 EAST |
| P.O. BOX 747 |
| FALLS CHURCH, VA 22040-0747 |
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