Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11910049
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Filing Dt:
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04/01/2008
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Publication #:
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Pub Dt:
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11/06/2008
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Inventors:
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Tetsuya Higuchi, Hirokazu Nosato, Masahiro Murakawa, Hidenori Sakanashi et al
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Title:
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Mask Pattern Designing Method Using Optical Proximity Correction in Optical Lithography, Designing Device, and Semiconductor Device Manufacturing Method Using the Same
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 3-1, KASUMIGASEKI 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8921 |
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| 2-6-2, OTEMACHI, CHIYODA-KU |
| TOKYO, JAPAN 100-0004 |
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| OBLON, SPIVAK, ET AL. |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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