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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
NONE
Issue Dt:
Application #:
11972615
Filing Dt:
01/10/2008
Publication #:
20080308881
Pub Dt:
12/18/2008
Inventors:
Stefan De Gendt, Lars-Ake Ragnarsson, Sven Van Elshocht, Shih-Hsun Chang et al
Title:
Method for Controlled Formation of a Gate Dielectric Stack
Assignment: 1
Reel/Frame:
023594/0846Recorded: 12/04/2009Pages: 22
Conveyance:
CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
Assignor:
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC)
Exec Dt:
01/16/1984
Assignee:
IMEC
KAPELDREEF 75
LEUVEN, BELGIUM 3001
Correspondent:
MCDONNELL BOEHNEN HULBERT & BERGHOFF LLP
300 SOUTH WACKER DRIVE
CHICAGO, IL 60606
Assignment: 2
Reel/Frame:
021458/0636Recorded: 08/28/2008Pages: 6
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
DE GENDT, STEFAN
Exec Dt:
07/08/2008
RAGNARSSON, LARS-AKE
Exec Dt:
07/31/2008
VAN ELSHOCHT, SVEN
Exec Dt:
07/31/2008
CHANG, SHIH-HSUN
Exec Dt:
07/31/2008
ADELMANN, CHRISTOPH
Exec Dt:
07/31/2008
SCHRAM, TOM
Exec Dt:
07/31/2008
Assignees:
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC)
KAPELDREEF 75
LEUVEN, BELGIUM 3001
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8, LI-HSIN ROAD 6
HSINCHU, TAIWAN 300-077
Correspondent:
MCDONNELL BOEHNEN HULBERT & BERGHOFF LLP
300 SOUTH WACKER DRIVE
SUITE 3200
CHICAGO, IL 60606

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