Patent Assignment Abstract of Title
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Total Assignments:
3
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Patent #:
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Issue Dt:
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11/16/2010
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Application #:
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12198912
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Filing Dt:
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08/27/2008
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Publication #:
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Pub Dt:
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12/25/2008
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Inventors:
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Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama, Masaki Mikami
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Title:
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REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE SAME
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 12-1, YURAKUCHO 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8405 |
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| OBLON, SPIVAK, ET AL. |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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Assignment:
2
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| 5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, |
| TOKYO, JAPAN 100-8405 |
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| CPA GLOBAL LIMITED |
| LIBERATION HOUSE |
| CASTLE STREET |
| ST HELIER, JEI IBL JERSEY |
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Assignment:
3
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, |
| TOKYO, JAPAN 100-8405 |
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| CPA |
| LIBERATION HOUSE |
| CASTLE STREET |
| ST HELIER, JEI IBL JERSEY |
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