Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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09/21/2010
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Application #:
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12300760
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Filing Dt:
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11/13/2008
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Publication #:
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Pub Dt:
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05/07/2009
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Inventors:
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Kotaro Endo, Makiko Irie, Takeshi Iwai, Tsuyoshi Nakamura, Yasuhiro Yoshii et al
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Title:
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POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150, NAKAMARUKO, NAKAHARA-KU |
| KAWASAKI-SHI, KANAGAWA-KEN, JAPAN |
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| KNOBBE MARTENS OLSON AND BEAR LLP |
| 2040 MAIN STREET |
| SUITE 1400 |
| IRVINE, CA 92614 |
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