Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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12515726
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Filing Dt:
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05/20/2009
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Publication #:
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Pub Dt:
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11/05/2009
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Inventors:
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Masahiko Tanaka, Akimitsu Oishi
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Title:
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SILICON STRUCTURE HAVING AN OPENING WHICH HAS A HIGH ASPECT RATIO, METHOD FOR MANUFACTURING THE SAME, SYSTEM FOR MANUFACTURING THE SAME, AND PROGRAM FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING ETCHING MASK FOR THE SILICON STRUCTURE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-10, FUSOCHO |
| AMAGASAKI-SHI, HYOGO, JAPAN 660-0891 |
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| DORSEY & WHITNEY LLP |
| 1420 FIFTH AVENUE |
| SUITE 3400 |
| SEATTLE, WA 98101-4010 |
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