Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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01/17/2012
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Application #:
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12441514
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Filing Dt:
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03/16/2009
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Publication #:
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Pub Dt:
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04/08/2010
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Inventors:
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Toshikazu Takayama, Keita Ishiduka, Hideo Hada, Shigeru Yokoi
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Title:
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MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF PHOTORESIST PATTERN, AND SOLUTION FOR WASHING/REMOVAL OF PROTECTIVE FILM
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150, NAKAMARUKO, NAKAHARA-KU, KANAGAWA |
| KAWASAKI-SHI, JAPAN 211-0012 |
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| KNOBBE MARTENS OLSON & BEAR LLP |
| 2040 MAIN STREET, 14TH FLOOR |
| IRVINE, CA 92614 |
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