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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
12659774
Filing Dt:
03/22/2010
Publication #:
20100178611
Pub Dt:
07/15/2010
Inventors:
Hirohito Anze, Takehiko Katsumata, Shuichi Tamamushi, Takashi Kamikubo, Rieko Nishimura et al
Title:
Lithography method of electron beam
Assignment: 1
Reel/Frame:
024493/0373Recorded: 06/07/2010Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
ANZE, HIROHITO
Exec Dt:
04/28/2010
KATSUMATA, TAKEHIKO
Exec Dt:
04/28/2010
TAMAMUSHI, SHUICHI
Exec Dt:
05/06/2010
KAMIKUBO, TAKASHI
Exec Dt:
04/28/2010
NISHIMURA, RIEKO
Exec Dt:
04/23/2010
HIRAMOTO, MAKOTO
Exec Dt:
04/28/2010
MOTOSUGI, TOMOO
Exec Dt:
04/28/2010
OHNISHI, TAKAYUKI
Exec Dt:
04/28/2010
Assignee:
NUFLARE TECHNOLOGY, INC.
2068-3, OOKA
NUMAZU-SHI, SHIZUOKA, JAPAN 410-8510
Correspondent:
OBLON, SPIVAK, ET AL.
1940 DUKE STREET
ALEXANDRIA, VA 22314

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