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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
08/20/2013
Application #:
12622114
Filing Dt:
11/19/2009
Publication #:
Pub Dt:
08/26/2010
Inventors:
Emile Sahouria, Yuanfang Hu
Title:
MASK MODEL CALIBRATION TECHNOLOGIES INVOLVING ETCH EFFECT AND EXPOSURE EFFECT
Assignment: 1
Reel/Frame:
024578/0906Recorded: 06/09/2010Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
05/05/2010
Exec Dt:
05/05/2010
Assignee:
8005 S.W. BOECKMAN ROAD
WILSONVILLE, OREGON 97070-7777
Correspondent:
MENTOR GRAPHICS CORPORATION
8005 S.W. BOECKMAN ROAD
LEGAL DEPARTMENT
WILSONVILLE, OR 97070-7777
Assignment: 2
Reel/Frame:
056510/0240Recorded: 06/02/2021Pages: 7
Conveyance:
MERGER AND CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
12/30/2020
Newly Merged Entity Data
Exec Dt:
12/30/2020
Newly Merged Entity's New Name:
5800 GRANITE PARKWAY, SUITE 600
PLANO, TEXAS 75024
Correspondent:
SIEMENS CORPORATION IP DEPT - MAIL CODE INT-244
3850 QUADRANGLE BOULEVARD
ORLANDO, FL 32817

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