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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
12805301
Filing Dt:
07/22/2010
Publication #:
Pub Dt:
01/27/2011
Inventors:
Hideo Nakamura, Yoshiro Kabe, Junichi Kitagawa
Title:
Method for forming silicon oxide film, storage medium, and plasma processing apparatus
Assignment: 1
Reel/Frame:
025099/0868Recorded: 10/06/2010Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
09/13/2010
Exec Dt:
09/13/2010
Exec Dt:
09/13/2010
Assignee:
3-1, AKASAKA 5-CHOME, MINATO-KU
TOKYO-TO, JAPAN
Correspondent:
MICHAEL A. MAKUCH
1130 CONNECTICUT AVE. NW, STE 1130
SMITH, GAMBRELL & RUSSELL, LLP
WASHINGTON, DC 20036

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