Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Total Assignments:
1
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
12934806
|
Filing Dt:
|
11/08/2010
|
|
Publication #:
|
|
Pub Dt:
|
02/24/2011
| | | | |
|
Inventors:
|
Hisashi Nakagawa, Yohei Nobe, Kang-go Chung, Terukazu Kokubo, Ryuichi Saito
|
|
Title:
|
MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM
|
|
|
Assignment:
1
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU |
| TOKYO, JAPAN 105-8640 |
|
|
|
|
| OBLON, SPIVAK, ET AL. |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
|
|
Search Results as of:
04/29/2024 12:42 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
