Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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NONE
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Issue Dt:
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Application #:
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13010688
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Filing Dt:
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01/20/2011
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Publication #:
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Pub Dt:
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09/29/2011
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Inventors:
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Jung-In PARK, Hi-Kuk Lee, Sang-Hyun Yun, Shi-Jin Sung, Sung-Yeol Jin, Cha-Dong Kim et al
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Title:
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PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 416, MAETAN-DONG, YEONGTONG-GU |
| SUWON-SI |
| GYEONGGI-DO, KOREA, REPUBLIC OF |
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| 802-8 DONGWOO FINE-CHEM IKSAN RESEARCH INSTITUTE |
| SINHEUNG-DONG, IKSAN-SI |
| JEONBUK, KOREA, REPUBLIC OF |
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| INNOVATION COUNSEL LLP |
| 21771 STEVENS CREEK BLVD |
| STE. 200 |
| CUPERTINO, CA 95014 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 95, SAMSUNG 2 RO, GIHEUNG-GU |
| YONGIN-CITY, GYEONGGI-DO, KOREA, REPUBLIC OF |
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| INNOVATION COUNSEL LLP |
| 21771 STEVENS CREEK BLVD. STE 2A |
| CUPERTINO, CA 95014 |
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