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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
9324567
Issue Dt:
04/26/2016
Application #:
13826600
Filing Dt:
03/14/2013
Publication #:
20130196509
Pub Dt:
08/01/2013
Inventors:
Martin D. Tabat, Christopher K. Olsen, Yan Shao, Ruairidh MacCrimmon, Luis Fernandez
Title:
Gas Cluster Ion Beam Etching Process for Etching Si-Containing, Ge-Containing, and Metal-Containing Materials
Assignment: 1
Reel/Frame:
030066/0137Recorded: 03/22/2013Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
TABAT, MARTIN D
Exec Dt:
03/19/2013
OLSEN, CHRISTOPHER K
Exec Dt:
03/20/2013
SHAO, YAN
Exec Dt:
03/18/2013
MACCRIMMON, RUAIRIDH
Exec Dt:
03/21/2013
FERNANDEZ, LUIS
Exec Dt:
03/12/2013
Assignee:
TEL EPION INC.
37 MANNING ROAD
BILLERICA, MASSACHUSETTS 01821
Correspondent:
TOKYO ELECTRON U.S. HOLDINGS, INC.
2545 W. FRYE RD.
SUITE 1
CHANDLER, AZ 85224
Assignment: 2
Reel/Frame:
051843/0245Recorded: 02/07/2020Pages: 17
Conveyance:
MERGER (SEE DOCUMENT FOR DETAILS).
Assignor:
TEL EPION INC.
Exec Dt:
01/01/2020
Assignee:
TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
3455 LYMAN BLVD.
CHASKA, MINNESOTA 55318
Correspondent:
TOKYO ELECTRON U.S. HOLDINGS, INC.
2400 GROVE BLVD
AUSTIN, TX 78741

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