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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
14007519
Filing Dt:
09/25/2013
Publication #:
Pub Dt:
01/23/2014
Inventors:
Hiroe Ejiri, Keitaro Sakamoto, Fumiyasu Nomura, Masanori Ueda
Title:
PLASMA CVD APPARATUS, PLASMA CVD METHOD, REACTIVE SPUTTERING APPARATUS, AND REACTIVE SPUTTERING METHOD
Assignment: 1
Reel/Frame:
032159/0869Recorded: 02/06/2014Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
07/11/2013
Exec Dt:
07/18/2013
Exec Dt:
07/23/2013
Exec Dt:
07/17/2013
Assignee:
1-1, NIHONBASHI-MUROMACHI 2-CHOME
CHUO-KU
TOKYO, JAPAN 1038666
Correspondent:
JOSHUA L. COHEN
P.O. BOX 980
VALLEY FORGE, PA 19482

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