Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Total Assignments:
1
|
|
Patent #:
|
|
Issue Dt:
|
03/08/2016
|
Application #:
|
14301835
|
Filing Dt:
|
06/11/2014
|
|
Publication #:
|
|
Pub Dt:
|
12/18/2014
| | | | |
|
Inventors:
|
BANQIU WU, AJAY KUMAR, RAO YALAMANCHILI, OMKARAM NALAMASU
|
|
Title:
|
METHODS FOR REDUCING LINE WIDTH ROUGHNESS AND/OR CRITICAL DIMENSION NONUNIFORMITY IN A PATTERNED PHOTORESIST LAYER
|
|
|
Assignment:
1
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 3050 BOWERS AVENUE |
| SANTA CLARA, CALIFORNIA 95054 |
|
|
|
|
| MOSER TABOADA/ALAN TABOADA |
| 1030 BROAD STREET |
| SUITE 203 |
| SHREWSBURY, NJ 07702 |
|
|
Search Results as of:
05/03/2024 04:47 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
