Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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02/28/2017
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Application #:
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14655190
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Filing Dt:
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06/24/2015
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Publication #:
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Pub Dt:
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11/19/2015
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Inventors:
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Kazuhiro HAMAMOTO, Toshihiko ORIHARA, Tsutomu SHOKI, Junichi HORIKAWA
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Title:
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MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING MASK BLANK SUBSTRATE, METHOD OF MANUFACTURING SUBSTRATE WITH REFLECTIVE FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 7-5, NAKA-OCHIAI 2-CHOME |
| SHINJUKU-KU, TOKYO, JAPAN 161-8525 |
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| SUGHRUE MION, PLLC |
| 2100 PENNSYLVANIA AVENUE, NW |
| SUITE 800 |
| WASHINGTON, DC 20037 |
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