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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
14808152
Filing Dt:
07/24/2015
Publication #:
Pub Dt:
02/04/2016
Inventors:
Sang In Lee, Chang Wan Hwang
Title:
Atomic Layer Deposition Method Using Source Precursor Transformed by Hydrogen Radical Exposure
Assignment: 1
Reel/Frame:
036324/0581Recorded: 08/14/2015Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
08/12/2015
Exec Dt:
08/13/2015
Assignee:
3191 LAURELVIEW COURT
FREMONT, CALIFORNIA 94538
Correspondent:
JAE WON SONG
FENWICK & WEST LLP
801 CALIFORNIA STREET
MOUNTAIN VIEW, CA 94041

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