Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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06/18/2019
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Application #:
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15080714
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Filing Dt:
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03/25/2016
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Publication #:
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Pub Dt:
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07/21/2016
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Inventors:
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Shuhei YAMAGUCHI, Natsumi YOKOKAWA, Tomotaka TSUCHIMURA, Koutarou TAKAHASHI
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Title:
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ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 26-30, NISHIAZABU 2-CHOME, MINATO-KU |
| TOKYO, JAPAN 106-8620 |
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| SUGHRUE MION PLLC |
| 2100 PENNSYLVANIA AVE NW |
| SUITE 800 |
| WASHINGTON, DC 20037 |
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