Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
Total Assignments:
1
|
Patent #:
|
|
Issue Dt:
|
01/07/2020
|
Application #:
|
15176762
|
Filing Dt:
|
06/08/2016
|
Publication #:
|
|
Pub Dt:
|
09/29/2016
| | | | |
Inventors:
|
Natsumi YOKOKAWA, Hidehiro MOCHIZUKI, Koutarou TAKAHASHI, Shuhei YAMAGUCHI
|
Title:
|
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
|
|
Assignment:
1
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
26-30, NISHIAZABU 2-CHOME, MINATO-KU |
TOKYO, JAPAN 106-8620 |
|
|
|
SUGHRUE MION, PLLC |
2100 PENNSYLVANIA AVENUE, N.W. |
SUITE 800 |
WASHINGTON, DC 20037 |
|
|
Search Results as of:
05/06/2024 12:10 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|