Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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07/03/2018
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Application #:
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15176810
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Filing Dt:
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06/08/2016
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Publication #:
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Pub Dt:
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09/29/2016
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Inventors:
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Shuhei YAMAGUCHI, Koutarou TAKAHASHI, Tomotaka TSUCHIMURA, Natsumi YOKOKAWA et al
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Title:
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND COMPOUND
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 26-30, NISHIAZABU 2-CHOME |
| MINATO-KU |
| TOKYO, JAPAN 106-8620 |
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| SUGHRUE MION PLLC |
| 2100 PENNSYLVANIA AVENUE NW |
| WASHINGTON, DC 20037 |
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